发明名称 IONIZING RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide the ionizing radiation sensitive resin composition capable of maintaining high heat resistance and wide development latitude without lowering high resolution and high sensitivity. CONSTITUTION:The ionizing radiation sensitive resin composition contains an alkali-soluble resin and an ionizing radiation sensitive resin, and further at least one kind of compound represented by formula I and/or formula II in an amount of 2-50wt.% of the alkali-soluble resin.
申请公布号 JPH04251849(A) 申请公布日期 1992.09.08
申请号 JP19910026708 申请日期 1991.01.29
申请人 FUJI PHOTO FILM CO LTD 发明人 SAKAGUCHI SHINJI
分类号 G03F7/023;G03F7/039;H01L21/027 主分类号 G03F7/023
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