| 摘要 |
PURPOSE:To enhance a pattern drawing accuracy by a method wherein, at a pattern drawing method used to perform an exposure treatment by partitioning a region, a supplementary region covering a boundary part where partitioned small regions are adjacent to each other is set and a multiple exposure operation is performed. CONSTITUTION:A chip region 1 is partitioned into three small regions of a first region (a), a second region (b) and an third region (c) at the same pitch in the vertical direction; a shaded part 2 is an exposure region for a pattern. At an electron-beam exposure process, an overlap error is caused between the first region (a) and the second region (b) due to the relative dislocation between an electron beam and a chip; on the other hand, an unexposure error is caused between the second region (b) and the third region (c). In order to correct the filling part between the three partitioned small regions, supplementary regions are set between the boundary part between the regions. A first supplementary region (ab) is set at the boundary between the first region (a) and the second region (b), and a second supplementary region (bc) is set in the same manner. When the first to third small regions and the first and second supplementary regions are exposed to light, a region 3 can be exposed to light. |
