| 摘要 |
PURPOSE:To obtain a substrate with an antireflection film having superior transmittance to any rays of light, improved thermal shock and hot water resistances by forming an antireflection film having superior adhesion and not causing cracking. CONSTITUTION:Colloidal silica of <=1,000Angstrom average particle size is dispersed in a soln. of a partial hydrolyzate of a silane compd. represented by formula 1, the soln. is applied and condensation and curing are carried out to form an undercoat layer on an org. polymer substrate. A multilayered antireflection film including one or more layers having >=1.9 refractive index is then formed on the undercoat layer. In the formula 1, each of R<1> and R<2> is H, 1-6C alkyl or alkenyl which may have a substituent, etc., R<3> is 1-6C hydrocarbon group, each of m and n is 0-2 and m+n=1 or 2. |
