发明名称 TREATMENT OF GAS CONTAINING HALOGEN-CONTAINING ORGANIC COMPOUND
摘要 PURPOSE:To treat a gas containing halogen-contg. organic compd. at lower temp. than the temp. of conventional method and to treat the halogen-contg. org. compd. without containing hydrogen by bringing the gas into contact with acid zeolite. CONSTITUTION:The gas containing halogen-contg. organic compd. is brought into contact with acid zeolite, preferably, the acid zeolite carrying one or more metals selected from the second to sixth periods of the periodical table or a zeolite having substitution of these metals. Thus, the halogen-contg. organic compd. is decomposed and removed. Examples of the halogen-contg. org. compd. to be treated include methane halide, ethane halide, fluoromethane, chloromethane, methane boride, etc. The zeolite to be used is in a form of powder or molding obtd. by usual method or pulverizaed one. The gas containing halogen-contg. organic compd. is brought into contact with the zeolite, for example, by introducing the gas into a layer packed with the zeolite.
申请公布号 JPH04250825(A) 申请公布日期 1992.09.07
申请号 JP19900418884 申请日期 1990.12.27
申请人 AGENCY OF IND SCIENCE & TECHNOL;TOSOH CORP 发明人 MIZUNO KOICHI;HINUMA YUTAKA;KOBAYASHI SATORU;KUSHIYAMA AKIRA;AIZAWA REIJI;OUCHI HIDEO;TAJIMA MASAHIRO;FUJII YASUSHI;ASANO SEIICHI
分类号 B01D53/86;B01J29/40;B01J29/42 主分类号 B01D53/86
代理机构 代理人
主权项
地址