| 发明名称 |
Cyclohexenyl compounds and photocurable resin compositions prepared therefrom |
| 摘要 |
Photoreactive compounds of the formula: <IMAGE> (where R1 is H, CH3 or C2H5; X is -O- or NH-; R2 is H, halogen or C1-C4 alkyl or alkoxy group, and m is 1 to 5) may be used in the preparation of photosensitive composition comprising a polymer of the said compound together with an azide compound (as photosensitivity-imparting agent). <IMAGE> |
| 申请公布号 |
GB2253208(A) |
申请公布日期 |
1992.09.02 |
| 申请号 |
GB19920003190 |
申请日期 |
1992.02.14 |
| 申请人 |
* CHISSO CORPORATION |
发明人 |
HIROYUKI * SATO;KATSUHIKO * KOBAYASHI;TAKANORI * FUKUMURA;TETSUYA * NAGAIE;TETSUYA * NAGAIE;HIROSHI * KAWABATA |
| 分类号 |
G02B5/20;C07C69/54;C07C233/09;C08F2/50;C08F20/18;C08F20/54;C08F299/00;G03C1/675;G03F7/00;G03F7/004;G03F7/008;G03F7/012;G03F7/027;G03F7/033 |
主分类号 |
G02B5/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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