| 摘要 |
PURPOSE:To uniformly wash a chemically etched metallic thin sheet by this device in the process for producing a shadow mask, etc. CONSTITUTION:A draining roll couple A is arranged directly after an etching tank H, an etchant suction means B is set thereafter, a single washing tank J is arranged on the downstream side, an inlet-side draining roll couple C1, an intermediate draining roll couple C2 and an outlet-side draining roll couple C3 are provided to the washing tank at regular intervals to divide the washing tank J into two sections, washing water injection means D1-D3 are arranged as shown in the figure, and water is injected toward a metallic thin sheet P from the water injection means. |
