发明名称 HIGH TEMPERATURE GAS CONTROLLING VALVE SYSTEM
摘要 <p>PURPOSE:To prevent any high temperature gas in a port from leaking to the side of a valve driving means by way of a clearance between a valve stem and a shaft hole without resting on such a means as making this clearance smaller. CONSTITUTION:An escape hole 27, interconnecting an intermediate part of a shaft hole 26 to the outside of a body 4, is installed in this body 4, whereby high temperature gas in a port 5 flowing into a clearance between a valve stem 12b and the shaft hole 26, where the valve stem 12b is inserted thereinto, is reached up to the intermediate part of the shaft hole 26 from the port 5, and subsequently, it is discharged to the outside of the body 4 by way of the escape hole 27, so that such a possibility that the high temperature gas might be reached to the side of an actuator A or a valve driving means after passing through the shaft hole 26 thoroughly is almost brought to nothing.</p>
申请公布号 JPH04244686(A) 申请公布日期 1992.09.01
申请号 JP19910027760 申请日期 1991.01.30
申请人 FUJI OOZX KK 发明人 SHIDA TOSHIMITSU
分类号 F01L9/02;F02B37/12;F02B37/18;F02M25/07;F16K31/126 主分类号 F01L9/02
代理机构 代理人
主权项
地址