发明名称 Method of manufacturing semiconductor laser
摘要 According to the structure of the invention, an AlGaInP cladding layer of one conductive type, an active layer, and an AlGaInP cladding layer of other conductive type greater in thickness in stripes are formed on a GaAs substrate, and an insulating film, AlGaInP or amorphous layer smaller in refractive index than the AlGaInP cladding layer are formed at both sides of the stripes, wherein the light can be confined and guided also in the direction parallel to the active layer, and the light can be index-guided both in the direction parallel to the active layer and in the direction vertical thereto, so that a laser having an extremely smaller astigmatism may be presented. What is more, the current blocking layer disposed at the outer side of the insulating film, AlGaInP or amorphous layer is high in thermal conductivity, and the heat generated in the vicinity of the active layer may be efficiently released. The invention also relates to the method of fabricating the laser composed in such structure.
申请公布号 US5143863(A) 申请公布日期 1992.09.01
申请号 US19910683181 申请日期 1991.04.09
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OHNAKA, KIYOSHI;OGURA, MOTOTSUGU
分类号 H01S5/22;H01S5/223;H01S5/227;H01S5/323 主分类号 H01S5/22
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