发明名称 |
MOLECULAR BEAM EPITAXY APPARATUS CONTAINING DUAL MOLECULAR BEAM CELL AND FORMING METHOD OF DUAL-EPITAXIAL LAYER |
摘要 |
The MBE apparatus for forming epitaxial layers on both sides simultaneously comprises a substrate (1) for growing the epitaxial layers, a substrate holder (2) for holding the substrate (1), a first molecular beam cell (3) for projecting materials in a form of molecular beams on one side of the substrate, a first shutter (5) for controlling the intermittence of the projected molecular beams, a second molecular beam cell (4) symmetric installed with centering around the substrate (1) to project the molecular beams on another side of the substrate, and a second shutter for controlling the intermittence of the beams projected from the cell (4).
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申请公布号 |
KR920007338(B1) |
申请公布日期 |
1992.08.31 |
申请号 |
KR19890019140 |
申请日期 |
1989.12.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM,JONG - RYOL;SONG, JAE - KYONG |
分类号 |
H01L21/20;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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