发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING SAME
摘要 PURPOSE:To provide the alkali-developable photosensitive resin composition and the photosensitive element superior in resolution, close adhesion, and resistance to etching and plating. CONSTITUTION:The photosensitive resin composition comprises (a) a polymer binder soluble in an aqueous solution of alkali and having carboxyl groups and/or dicarboxylic anhydride groups, and aromatic rings, (b) an oligomer soluble in an aqueous solution of alkali and having carboxyl groups and photoreactive unsaturated groups on the side chains, and (c) a sensitizer and/or its system to be allowed to produce free radicals; and having a difference between the refractive indeces of the binder (a) and the oligomer (b) of <=0.04 at 25 deg.C.
申请公布号 JPH04240854(A) 申请公布日期 1992.08.28
申请号 JP19910007988 申请日期 1991.01.25
申请人 HITACHI CHEM CO LTD 发明人 TSUKADA KATSUSHIGE
分类号 G03F7/004;G03F7/027;G03F7/031;G03F7/033;H01L21/027;H01L21/30;H05K3/00;H05K3/06;H05K3/28 主分类号 G03F7/004
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