发明名称 METHOD AND MASK FOR PROXIMITY EXPOSURE
摘要 PURPOSE:To offer a mask for a proximity exposure on which foreign matter is easy to stick to both surfaces of the mask is reduceable or unresolvable on a proximity exposure. CONSTITUTION:A groove 3 having constant width and depth is provided on a place corresponding to the outside dimension of a substrate 2 transferring the pattern of the mask 1, on its pattern surface. A resist 4 with which the substrate 2 is coated is risen so as to form a projection, on the outer peripheral part, and the groove 3 fitting into the projection is on the surface of the mask 1. On the other hand, a mask cover 7 on which a glass plate 6 is fixed on the upper side of a frame 5 which is more or less larger than the outside diameter of the mask 1, is provided on the side opposite to the pattern surface. Therefore, yielding is improved, and simultaneously, cost can be reduced. Thus, an effect that a contribution is made to reduction in the cost of a product that plotting by the proximity exposure is carried out, is expected.
申请公布号 JPH04240851(A) 申请公布日期 1992.08.28
申请号 JP19910007537 申请日期 1991.01.25
申请人 HITACHI LTD 发明人 TANAKA TSUTOMU;MATSUZAKI HIDEO;KIKUMOTO ATSUSHI
分类号 G03F1/38;G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/38
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