| 摘要 |
PURPOSE:To provide the multilayered resists suitable for patterning with good dimensional accuracy. CONSTITUTION:The multilayered resists are constituted of the multilayered resists consisting of a lower layer resist 2 which absorbs 1st light 11 having a 1st wavelength and is not sensitive to the 1st light and 2nd light 12 having the wavelength shorter than wavelength of the 1st light and an upper layer resist 1 which is not sensitive with the 1st light 11 and is sensitive with the 2nd light 12. The above-mentioned resists are also constituted of the multilayered resists consisting of the lower layer resists 3, 4 which absorb the 1st light 11 having the 1st wavelength and the 2nd light 12 having the wavelength shorter than the wavelength of the 1st light and the upper layer resist 1 which is not sensitive with the 1st light 11 and is sensitive with the 2nd light 12. |
