| 摘要 |
PURPOSE:To securely match the phases of a fundamental harmonics and a 2nd higher harmonics with each other by forming a ridge type thin film waveguide and precisely adjusting its final film thickness by utilizing the step of the ridge part. CONSTITUTION:A thin film waveguide layer is formed on a substrate and the film thickness of the thin film is measured and adjusted by etching to form the waveguide layer which has the specific ridge part in a channel type waveguide formation area. The size of the step of the ridge part is measured and the ratio of the ridge part height (t) and overall film thickness T is measured to calculate the absolute value of the accurate film thickness of the waveguide part. Then etching, polishing, and film thickness measurement are repeated according to the calculated film thickness until the final film thickness reaches phase-matched film thickness to form the ridge-shaped channel type waveguide. |
