| 摘要 |
PURPOSE: To obtain the microlens which is partially or completely hollowed by etching a hardened bake island and an auxiliary part of a substrate and a pattern formation layer. CONSTITUTION: Pattern formation layers 54, 11, and 12 are formed on the main surface of an InP substrate 10 and baked. The pattern formation layers have island parts 11 and 12 on predetermined parts of the substrate and the auxiliary part 54 which surround them, and the former becomes the hardened bake island part having a predetermined circumferential field and capacity. The latter, on the other hand, becomes a hardened bake auxiliary part having capacity larger than the predetermined capacity. Then the hardened bake islands and auxiliary part of the substrate 10 and pattern formation layers are etched at the same time. Consequently, the top parts of dome-shaped InP areas 32 and 32 project slightly from an auxiliary InP part 74 surrounding the island to form the partially hollowed microlens. |
