发明名称 PARALLEL BEAM METHOD X-RAY DIFFRACTOMETER
摘要 PURPOSE:To obtain a correct measurement result with high reproducibility even when a face blur occurs on the surface of a thin film sample. CONSTITUTION:A thin film sample 5 is driven by a sample base pulse motor 3 and rotated in the plane for an integral number of times centering on the horizontal axis PHI during the sampling period for measuring the intensity of diffracted X-rays with an X-ray detector 16. X-ray diffraction measurement is performed on the surface of the thin film sample 5 with a face blur while the face blur position invariably passes the same position by integer times. Fluctuation of individual sampling conditions due to the face blur becomes nil, and the X-ray diffraction measurement with high reproducibility can be performed.
申请公布号 JPH04232844(A) 申请公布日期 1992.08.21
申请号 JP19900416273 申请日期 1990.12.28
申请人 RIGAKU CORP 发明人 OKANDA HITOSHI;KATO TOSHIYUKI
分类号 G01N23/207 主分类号 G01N23/207
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