发明名称 METHOD FOR CONTROLLING RETICLE OR MASK
摘要 <p>PURPOSE:To easily obtain information by combining exposure data and control information relating to a method for controlling reticle or mask. CONSTITUTION:The method is characterized by fetching the attendant information of an arbitrary reticle or mask from an information file, and combining the relevant control information and the exposure data of the corresponding reticle or mask, thereby generating fresh exposure-data, the position where the above-mentioned control information is joined preferably after the end of the exposure-data.</p>
申请公布号 JPH04232949(A) 申请公布日期 1992.08.21
申请号 JP19900408891 申请日期 1990.12.28
申请人 FUJITSU LTD 发明人 OKADA TOMOYUKI;SAKURAI MITSUO
分类号 G03F1/38;G03F1/76;H01L21/02;H01L21/027;H01L21/30 主分类号 G03F1/38
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