摘要 |
<p>PURPOSE:To obtain a manufacturing method of a solid-state color image sensing device provided with a color filter wherein light mingling is not generated between adjacent picture elements, by making the pattern size and the shape of a color filter uniform. CONSTITUTION:The following are provided; a process wherein a semiconductor substrate 1 on which solid-state image sensing elements are formed is coated with transparent polymer resin 3a, a process wherein the transparent polymer resin 3a is left only in recessed parts on the substrate 1 surface, and a flat layer 7 is formed, and a process for foming a color filter on the semiconductor substrate 1.</p> |