| 摘要 |
The invention relates to a method of forming a free standing shape made of a material containing refractory metal comprising the steps of providing a mandrel in a CVD enclosure, injecting a refractory metal halide gas and a reducing gas in said enclosure, reacting said gases in said enclosure to generate a material containing refractory metal, growing a layer of said material containing refractory metal on said mandrel, then removing the mandrel to obtain said free standing shape. According to the invention, the reducing gas is selected among the silicon hydride gases and their mixtures. Pure refractory metal as well as anti-corrosion WSiz layers are obtained : multi layers free standing shapes can be made in a continuous process. |
