发明名称 BIPOLAR TRANSISTOR FEATURE AND PROCESS FOR PRODUCING IT
摘要 The invention calls for an emitter (14), base (6) and collector (15) to be disposed in a vertical sequence in such a way in an epitaxial layer (3) deposited on a substrate (1) that the emitter (14) adjoins the surface of the epitaxial layer. The emitter (14) and base (6) are delimited at each side by an insulating zone (4, 8). The base (6) has a region (61), at the edges adjacent to the insulating zone, which is more highly doped than the rest of the base (6). This base edge region (61) is preferably produced by diffusion from boron silicate glass spacers (8) located above it.
申请公布号 WO9214267(A1) 申请公布日期 1992.08.20
申请号 WO1992DE00045 申请日期 1992.01.27
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 KLOSE, HELMUT
分类号 H01L29/73;H01L21/225;H01L21/331;H01L29/10;H01L29/732 主分类号 H01L29/73
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