发明名称 PHOTOMASK TESTER
摘要 <p>PURPOSE:To measure an accurate phase variation by a phase member in a phase shift photomask easily and speedily. CONSTITUTION:This tester is provided with an irradiation optical system (consisting of those of illuminant 1, spectroscope 2, lenses 3a, 3b) irradiating a photomast 4 or a subject to be tested with monochromatic light as varying the wavelength in the specified range, and an imaging lens 5 forming a tested pattern image of the photomask 4, plus photoelectric converters 6, 7 detecting a light quantity on an imaging surface and a Fourier transform surface, and on the basis of a ratio of light quantities on these two surfaces, a phase variation is calculated by a computer 8.</p>
申请公布号 JPH04229864(A) 申请公布日期 1992.08.19
申请号 JP19900415192 申请日期 1990.12.27
申请人 NIKON CORP 发明人 HIRUKAWA SHIGERU;UMAGOME NOBUTAKA
分类号 G01B11/24;G01B11/245;G01N21/88;G01N21/956;G03F1/84;H01L21/027;H01L21/30 主分类号 G01B11/24
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