发明名称 |
METHOD FOR CONVERTING SILICA PRECURSOR INTO SILICA AT LOW TEMPERATURE |
摘要 |
This invention relates to a low temperature method of converting silica precursor coatings to ceramic silica coatings. The method comprises applying a silica precursor coating to a substrate, exposing the coating to an environment comprising ammonium hydroxide and/or wet ammonia vapors and subjecting the coating to a temperature sufficient to yield the ceramic coating. The methods of the invention are particularly applicable to applying coatings on electronic devices. |
申请公布号 |
JPH04227980(A) |
申请公布日期 |
1992.08.18 |
申请号 |
JP19910131109 |
申请日期 |
1991.06.03 |
申请人 |
DOW CORNING CORP |
发明人 |
GURITSUSHIYU CHIYANDORA;ROOREN ANDORIYUU HARUSUKA;KEISU UINTON MAIKERU;KAARU JIYOZEFU BIRUGURIEN |
分类号 |
C09D183/02;B05D7/24;C04B41/50;C04B41/87;C09D183/00;C09D183/04;H01L21/316;H05K3/24;H05K3/46 |
主分类号 |
C09D183/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|