发明名称 ACICULAR OR PLATE LOWER TITANIUM OXIDE AND ITS PRODUCTION
摘要 <p>PURPOSE:To improve the electrical conductivity of the subject substance by applying a specific amount of a silicon compound to the substance and reducing the product to get a shape-anisotropic material expressed by a specific formula. CONSTITUTION:A slurry of acicular or plate titanium dioxide is mixed with 0.5-30wt.% (in terms of SiO2) of a silicon compound such as sodium silicate and the mixture is heated at >=60 deg.C. The heat-treated slurry is neutralized to pH 5-8 with an acid such as hydrochloric acid and sulfuric acid and the neutralized product is dehydrated, washed and dried to obtain acicular or plate titanium dioxide coated with high-density SiO2. The product is incorporated with one or more kinds of reducing substance such as alkylamine (e.g. methylamine) or organic fatty acid (e.g. stearic acid) and reduced by heating at 700-1200 deg.C in an inert gas atmosphere to obtain the objective lower titanium oxide expressed by formula (X is positive real number of <2), encapsulated with a high-density SiO2 capsule and having a shape anisotropy characterized by the acicular ratio or plate ratio of >=3.</p>
申请公布号 JPH04228426(A) 申请公布日期 1992.08.18
申请号 JP19910128855 申请日期 1991.03.15
申请人 ISHIHARA SANGYO KAISHA LTD 发明人 OKUDA HARUO;YAMAGUCHI HISANOBU;TAKAHASHI HIDEO
分类号 C01G23/04;C08K7/00;C09C1/00;C09C1/36;C09D5/24;H01B1/08;H01B1/20 主分类号 C01G23/04
代理机构 代理人
主权项
地址