发明名称 RADIATION SENSITIVE MIXTURE AND RADIATION SENSITIVE RECORDING MATERIAL FOR ACTION OF POSITIVE FOR EXPOSURE IN DEEP UV RADIATION
摘要 PURPOSE: To obtain the mixture having high sensitivity to ultraviolet radiation by using a specific compound as a photoactive component. CONSTITUTION: In this mixture, a compound that containsα-diazo-β-keto ester units and sulfonic ester units and is represented by the formula I, is used. In the formula I: each of R<1> and R<2> is an aliphatic group having 4 to 20 carbon atoms or a cycloaliphatic, aromatic-aliphatic or aromatic group, independently from the other, wherein each of CH2 groups of R<1> and R<2> can be substituted by an oxygen or sulfur atom or an N or NH group, and/or each of R<1> and R<2> contains a keto group; X is an aliphatic group having 2 to 22 carbon atoms or a cycloaliphatic, carbocyclic, heterocyclic or aromatic-aliphatic group, wherein each of CH2 groups of X can be substituted by an oxygen or sulfur atom, -NR<3> group, or the like, and/or each of CH groups of X can be substituted by-N= (wherein each of R<3> and R<4> is hydrogen or an aliphatic, carbocyclic or aromatic- aliphatic group, independently from the other); (m) is an integer of 3 to 8; and (n) is an integer of 1 to 3.
申请公布号 JPH04226456(A) 申请公布日期 1992.08.17
申请号 JP19910131952 申请日期 1991.05.08
申请人 HOECHST AG 发明人 HORUSUTO RESHIYAATO;GEORUKU PAUROUSUKII;HANSUUYOAHIMU MEREMU;RARUFU DANMERU;WARUTAA SHIYUPIISU
分类号 G03F7/016;G03F7/039;H01L21/027 主分类号 G03F7/016
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