| 摘要 |
PURPOSE:To provide a horizontal type projecting/exposing device exposing plural comparatively large-sized patterns to the member to be exposed of a large area with high precision by stepping and repeating. CONSTITUTION:Exposing light from a light source 1 is projected along a horizontal optical axis L1, and forms an image on a member to be exposed S held by an exposing part holding mechanism 50 via a mask M arranged on the horizontal optical axis L1, and a projecting lens PL. At this time, the member to be exposed S is held in a vertical direction, so that the member to be exposed S is prevented from having distortion by its dead weight, and a high precise exposure can be carried out. |
