| 发明名称 |
METHOD FOR TREATING WASTE GAS |
| 摘要 |
<p>PURPOSE:To make nitrogen trifluoride- and/or active fluorides-containing gas harmless. CONSTITUTION:The gas is brought into contact with silicon nitride at temperatures not lower than 200 deg.C and after that, is washed with aqueous alkali. Waste gas which does not substantially include nitrogen trifluoride and/or active fluorides is obtained.</p> |
| 申请公布号 |
JPH04225818(A) |
申请公布日期 |
1992.08.14 |
| 申请号 |
JP19900414719 |
申请日期 |
1990.12.27 |
| 申请人 |
SHOWA DENKO KK |
发明人 |
KASHIWADA KUNIO;HASUMOTO TOSHIHARU;TORISU JUNICHI;KONISHI MINORU |
| 分类号 |
B01D53/56;B01D53/34;B01D53/54;B01D53/68 |
主分类号 |
B01D53/56 |
| 代理机构 |
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| 地址 |
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