发明名称 |
METHOD AND APPARATUS FOR MEASUREMENT OF PHYSICAL PROPERTIES OF MATERIAL |
摘要 |
PURPOSE: To measure material property of a lateral dopant profile by making a fine chip move, while crossing to the surface of the material in a predeter mined area, and detecting a value of parameter corresponding to a capacitance with respect to a specified position for continuous collection. CONSTITUTION: With a metal fine chip 30 suspended above a sample 32 of a semiconductor material, a computer 40 applies a voltage between the fine chip 30 and the sample 32. A proximity sensor 34 detects the interval between the fine chip 30 and the sample 32. Then, the signal representing the interval is supplied to a feedback control circuit 36. The signal generated by the feedback control circuit 36 is supplied to a positioning device 38 so that a relative interval between the fine chip 30 and the sample 32 is kept constant. The signal is also supplied to the computer 40 the information representing the minute fluctuations in the surface shape of the sample 32. |
申请公布号 |
JPH04225247(A) |
申请公布日期 |
1992.08.14 |
申请号 |
JP19910042186 |
申请日期 |
1991.02.15 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
JIEEMUSU ARUBAATO SURINKUMAN;EMANTA KIYUMAARU BUITSUKURAMAZAN;KUREITON KOOBEI UIRIAMUSU |
分类号 |
G01N27/22;G01N27/24;G01Q30/04;G01Q60/46;H01L21/66 |
主分类号 |
G01N27/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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