发明名称 RESIST TREATING METHOD
摘要 PURPOSE:To provide a method for treating resist excellently without attachment of gas to a transmitting window even under normal atmosphere even though the gas is generated by the irradiation of ultraviolet rays. CONSTITUTION:A transmitting window 8 is arranged between a high-voltage mercury lamp 1 which emits radiant light containing ultraviolet rays and resist 4 which is illuminated and treated with the radiant light. The atmosphere of air or inactive gas or the mixed gas thereof is formed in the vicinity of the transmitting window. Thus, the contamination of the transmitting window 8 with the gas generated from the resist 4 is reduced.
申请公布号 JPH04225217(A) 申请公布日期 1992.08.14
申请号 JP19900413888 申请日期 1990.12.26
申请人 USHIO INC 发明人 MORIWAKI AKIRA
分类号 G03F7/26;H01L21/027 主分类号 G03F7/26
代理机构 代理人
主权项
地址