摘要 |
The DRAM (10) cells contain each a transistor and a capacitor. The DRAM has a number of spaced cell blocks (12), each with a cell (MC) matrix of lines and columns on a substrate (14) Bil (BL) and word lines (WL) are coupled to the lines and columns respectively. PMOS and NMOS read-out amplifier sections (16, 18) are each coupled to the cell blocks. Between the PMOS sections are distributed PMOS driven FETs (20a-c) such that one FET (20b) of both sections is fitted between two adjacent PMOS sections (16a, b). The same arrangement is provided for the MMOS driver FETs (22a-c) w.r.t. the NMOS sections and the NMOS FET (22b) between the sections (18a, b). The system contains source voltage supply lines (36a, 38a). ADVANTAGE - Max. operational speed without impairing the integration density.
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申请人 |
KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP |
发明人 |
TAKASHIMA, DAISABURO, KAWASAKI, JP;OOWAKI, YUKIHITO, YOKOHAMA, JP;TSUCHIDA, KENJI, KAWASAKI, JP |