发明名称 |
Heat pipe susceptor for epitaxy |
摘要 |
The present invention is a heat pipe susceptor for use in a vapor deposition system. The multi-layered refractory material susceptor provides a highly uniform heated surface upon which wafers are placed for heating by a radio frequency (RF) source. Because of the highly uniform surface temperature, susceptors are able to hold a plurality of inch sized diameter wafers and the shape of the surfaces can be designed as the need arises. A cylindrically shaped top and a multi-faced frustum shaped top are examples.
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申请公布号 |
US5136978(A) |
申请公布日期 |
1992.08.11 |
申请号 |
US19890431491 |
申请日期 |
1989.10.30 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE |
发明人 |
AHERN, BRIAN S.;WEYBURNE, DAVID W. |
分类号 |
C23C16/458;C30B25/10;C30B25/12 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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