发明名称 METHOD FOR DETECTING PATTERN POSITION
摘要 PURPOSE:To automatically detect a position of a pattern to be inspected from change in accumulated values at the time of image scanning for each measurement point by a method wherein the accumulated values of brightness slopes in each specific direction at each measurement point of an array corresponding to an outline of the pattern to be inspected vary according to coincidence in the specific direction with the outline. CONSTITUTION:An image of a pattern to be inspected wherein the image of the pattern has been picked up is scanned at a plurality of measurement points which have been set according to an outline of the pattern to be inspected and are distant from one another by a predetermined distance and at a reference point, and accumulated values of detected brightness slopes at the respective measurement points at the time of scans and a position of the scanning reference point are stored, so that a position of the scanning reference point where the accumulated value is maximum is discriminated to determine the position of the pattern to be inspected.
申请公布号 JPH04220506(A) 申请公布日期 1992.08.11
申请号 JP19900404369 申请日期 1990.12.20
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HATA JUNICHI;IZUMIDA KEIZO;MORIMOTO MASAMICHI;SHIMIZU TAKASHI
分类号 G01B11/00;G06T1/00;G06T7/00;G06T7/60;H05K13/04 主分类号 G01B11/00
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