| 摘要 |
PURPOSE:To provide a resist developing device possible to perform uniform and stable developing by preventing mechanical consumption of a resist film, caused by concentrical delivery of processing liquid, and diffusing the processing liquid to a processed substrate total surface in a short time, in the case of resist developing of a processed substrate having an exposure-finished resist film used for an optical disk or the like. CONSTITUTION:By providing constitution such that a processing liquid straightening disc 7, opposedly faced parallelly so that a space 8 can be provided between the disk and a processed substrate 1, is provided in a point end of liquid supply nozzle 11 positioned above the center of rotation of a turn table 2 for rotating the processed substrate 1, to jet diffuse processing liquid energetically on a surface of the processed substrate 1 by the above-mentioned space 8, the processing liquid is uniformly diffused on the processed substrate 1 in a short time by centrifugal force by rotating the processed substrate 1 and by jet force of the processing liquid, to realize a resist developing device which can perform uniform and stable developing. |
