| 摘要 |
Etching regulation device in which a light beam (FI) is sent towards a face of a component (6) to be etched. Various layers of the component (6) reflect this beam and give rise to several reflected beams, the interference of which is detected by a detector (5). In order to measure the depth of the etching with precision, it is suitable to superpose the reflected beam (FR) with a portion (F11) of the incident beam on the detector. The invention provides a removable mirror (8) controlled by displacement means (9) and allowing visualisation on a screen (15) of these various beams, in order to allow them to be aligned with precision. APPLICATION: etching of electronic components. <IMAGE>
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