| 摘要 |
<p>PURPOSE:To provide the resist composition having fluid characteristics capable of forming a uniformly thin resist film by a dipping process. CONSTITUTION:The fluid resist composition is characterized by satisfying the following three requirements; (a) being a plastic fluid or a pseudoplastic fluid, (b) having an apparent viscosity of <=200cp when its shear rate is >=30s<-1>, and >=250cp when it <=5s<-1>, and (c) having a fine powder of <=1mum particle diameter at least partially subjected to hydrophobicness-enhancing treatment added to the composition in order to obtain said fluid characteristics of (a) and (b).</p> |
