发明名称 FOCUS ADJUSTER FOR LIGHT BEAM EXPOSURE DEVICE
摘要 PURPOSE:To prevent deterioration of a picture quality, caused by fluctuation of a focus position, by correcting the focus position in accordance with a temperature. CONSTITUTION:A light beam exposure device exposes a sensitized material 54 by a recording lens 50. The recording lens 50 is arranged movably in a direction of an optical axis while converging a light beam. A temperature in an internal part of the before-mentioned device is measured by a temperature sensor 70. In a control circuit 78, a table for representing a focus position relating to the above-mentioned temperature is stored to move the recording lens 50 in the optical axis direction by controlling an actuator 80 so that a focus of the recording lens 50 is positioned in the focus position in accordance with the temperature, measured by the temperature sensor 70, by referring to the above-mentioned table. Consequently, the focus position of the recording lens 50 is maintained to the adequate position regardless of the temperature.
申请公布号 JPH04217238(A) 申请公布日期 1992.08.07
申请号 JP19900403592 申请日期 1990.12.19
申请人 FUJI PHOTO FILM CO LTD 发明人 MATSUOKA HIROSHI
分类号 G02B7/28;G03B27/34 主分类号 G02B7/28
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