| 摘要 |
<p>PURPOSE:To pattern a shielding film into specified dimension in good accuracy. CONSTITUTION:Tungsten 6 as a X-ray absorbing film (shielding film) is provided not only on the surface of a film 2 being a X-ray transmitting substrate but on the whole surface of the substrate. A resist pattern 7 is formed on the tungsten film 6 while GND potential is applied on the tungsten 6. Thereby, charges accumulating in the resist pattern 7 are discharged through the tungsten 6. Thereby, the resist pattern 7 is free from displacement or deformation due to accumulation of charges, so that the tungsten 6 can be patterned into specified dimension in good accuracy when the tungsten 6 is etched with using the resist pattern 7 as a mask.</p> |
