发明名称 RADIATION SENSITIVE MIXTURE
摘要 PURPOSE: To economically obtain a positive photoresist having good reproducibility and high resolving power by a short-wave UV. CONSTITUTION: This radiation-sensitive mixture consists of a polymer binder composed mainly of novolac base insoluble in water and soluble in an aq. alkaline soln. or a polymer binder mixture, an onium salt generating a strong acid when exposed to radiation and a pyrocatechol derivative suppressing the solubility of the polymer base in the aq. alkaline soln.
申请公布号 JPH04215662(A) 申请公布日期 1992.08.06
申请号 JP19910024649 申请日期 1991.02.19
申请人 BASF AG 发明人 ZON GUIEN KIMU
分类号 G03F7/004;G03F7/023;G03F7/029;G03F7/039;H01L21/027 主分类号 G03F7/004
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