| 摘要 |
PURPOSE:To attain productin of a large-sized reticle for high integration of device by decreasing distortion in the reticle without increasing its thickness. CONSTITUTION:A reticle 1 is supported at plural points 21-24 in a manner that at least one of lines connecting adjacent supporting points passes on a circuit pattern on the reticle. The area surrounded by the lines connecting the supporting points is almost half of the reticle surface. In the outside of the area surrounded by the lines connecting the supporting points, the reticle is pressed downward, and the second type of supporting points are provided in a manner that the second supporting body is equal or lower than the first supporting point. Then the height of the pattern surface on the reticle is checked to decrease distortion of the reticle. |
