| 摘要 |
PURPOSE:To make development uniform and improve the quality of substrate surface, concerning the substrate processing method of performing the development processing of the substrate after specified processing. CONSTITUTION:The substrate after specified processing is soaked in the developer 3 filled in a developer vessel 2 so as to perform development, and after development, this developer 3 is discharged, and that substrate 5 is rinsed in rinse liquid 12. And that substrate 5 is dried, and said developing vessel 2 is rotated to remove that rinse liquid 12. |
