发明名称 |
SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURE |
摘要 |
PURPOSE:To obtain a semiconductor storage device having a well structure which prevents undershoot occurring by an input signal and deterioration of transistor characteristics. CONSTITUTION:A plurality of N well regions and P well regions are formed on the main surface of a semiconductor substrate. The periphery of the P well region is surrounded by the N well region kept at a positive potential. Said N well region forms a junction between a P-type semiconductor substrate and the P well region. Said junction prevents electrons from being injected toward the P well region which electrons are generated from the P-type semiconductor substrate by shoot. |
申请公布号 |
JPH04212453(A) |
申请公布日期 |
1992.08.04 |
申请号 |
JP19910052097 |
申请日期 |
1991.03.18 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
OKUMURA YOSHIKI;ARIMA HIDEAKI;OKUDAIRA TOMOHITO |
分类号 |
H01L27/10;H01L21/8242;H01L27/02;H01L27/105;H01L27/108 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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