发明名称 SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURE
摘要 PURPOSE:To obtain a semiconductor storage device having a well structure which prevents undershoot occurring by an input signal and deterioration of transistor characteristics. CONSTITUTION:A plurality of N well regions and P well regions are formed on the main surface of a semiconductor substrate. The periphery of the P well region is surrounded by the N well region kept at a positive potential. Said N well region forms a junction between a P-type semiconductor substrate and the P well region. Said junction prevents electrons from being injected toward the P well region which electrons are generated from the P-type semiconductor substrate by shoot.
申请公布号 JPH04212453(A) 申请公布日期 1992.08.04
申请号 JP19910052097 申请日期 1991.03.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 OKUMURA YOSHIKI;ARIMA HIDEAKI;OKUDAIRA TOMOHITO
分类号 H01L27/10;H01L21/8242;H01L27/02;H01L27/105;H01L27/108 主分类号 H01L27/10
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