发明名称 ABSTRACT PATTERN DESIGN SIMULATION SYSTEM
摘要 PURPOSE:To reduce the work load of a design of a pattern of a unit raw material by constituting the system so that an original pattern and a desired cloth pattern can be synthesized easily, in an abstract pattern building material printing. CONSTITUTION:In an original pattern memory part 6, image data of an original. pattern created by a designer is stored. In a DB accumulating part 7, image data of a cloth pattern read in from an input scanner 1 is accumulated, and a cloth pattern data base is constructed. A DB retrieving part 9 retrieves an instructed cloth pattern, and writes it in an image memory part 10. An image synthesizing part 13 performs an instructed operation to the original. pattern and the retrieved cloth pattern, and synthesizes two cloth patterns. The synthesized pattern is written in the image memory part 10, and also, displayed on a color CRT 4.
申请公布号 JPH04213769(A) 申请公布日期 1992.08.04
申请号 JP19900401277 申请日期 1990.12.11
申请人 DAINIPPON PRINTING CO LTD 发明人 KURATA MICHIO;MOTEGI TOSHIO;MUROTA HIDEKI;ARAI EISUKE
分类号 B41C1/00;G03G13/26;G03G15/01;G06F17/50;G06T3/00;G06T11/80 主分类号 B41C1/00
代理机构 代理人
主权项
地址