发明名称 |
RESIST COMPOSITION |
摘要 |
<p>PURPOSE:To provide a radiation sensitive resist component which can obtain a pattern of high sensitivity and high resolution. CONSTITUTION:A resist component includes a soluble conductive polymer and a compound which is sensitive to radiation and generates acid (acid generating agent) and a resist compound which includes a soluble conductive polymer in a dope state and a compound which is sensitive to radiation and generates base (base generating agent).</p> |
申请公布号 |
JPH04212962(A) |
申请公布日期 |
1992.08.04 |
申请号 |
JP19910061960 |
申请日期 |
1991.03.26 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
HORIBE HIDEO;FUCHIGAMI HIROYUKI;TANAKA SACHIKO;KUMADA TERUHIKO;KUBOTA SHIGERU;HIZUKA YUJI |
分类号 |
G03F7/004;G03F7/029;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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