发明名称 RESIST COMPOSITION
摘要 <p>PURPOSE:To provide a radiation sensitive resist component which can obtain a pattern of high sensitivity and high resolution. CONSTITUTION:A resist component includes a soluble conductive polymer and a compound which is sensitive to radiation and generates acid (acid generating agent) and a resist compound which includes a soluble conductive polymer in a dope state and a compound which is sensitive to radiation and generates base (base generating agent).</p>
申请公布号 JPH04212962(A) 申请公布日期 1992.08.04
申请号 JP19910061960 申请日期 1991.03.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 HORIBE HIDEO;FUCHIGAMI HIROYUKI;TANAKA SACHIKO;KUMADA TERUHIKO;KUBOTA SHIGERU;HIZUKA YUJI
分类号 G03F7/004;G03F7/029;G03F7/038;G03F7/039;H01L21/027 主分类号 G03F7/004
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