| 摘要 |
PURPOSE:To dispense with usual expensive polising process by forming a multilayer film by means of ion assist evaporation, using fluorinated polyimide thin film for a substrate part, providing high accuracy, high stability and a tree growing ability at low temperature, and making into the multilayer thin film from the beginning. CONSTITUTION:A liquid fluorinated polyimide material is applied on a temporary substrate having smooth surface by required thickness, and is dried up, and is hardened so as to form a fluorinated polyimide thin film 19. Furthermore, after a dielectric multilayer film 20 is formed on this fluorinated polyimide thin film 19, the fluorinated polyimide thin film 19, where the dielectric multilayer film 20 is formed on the surface, is separated from the temporary substrate so as to manufacture a dielectric multilayer film filter 21. |
