| 摘要 |
PURPOSE:To optimize the performance and yield of a semiconductor device at a low cost by changing the projecting magnification of a pattern formed on a photomask to a wafer. CONSTITUTION:Light emitted from a light source 11 advances along an optical path A after the light is condensed by means of elliptic mirrors 12 and the ultraviolet component of the light is reflected by means of a cold mirror 13 and its flux distributing characteristic is uniformized by a fly's-eye lens 14. Then the light irradiates a pattern 31 for confirming projecting magnification on a reticle 30 through a reflecting mirror 15 and condenser lens 16. A magnification detector 33 finds the projecting magnification of a projection lens 32 by detecting the projecting magnification of the pattern 31 and sends the found value to a magnification controller 34. The magnification of the lens 32 is changed until a desired magnification is obtained. |
