发明名称 Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate
摘要 A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) <IMAGE> (I) wherein R1 represents <IMAGE> R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, and R3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule and (B) an acrylic resin having a salt-forming group.
申请公布号 US5134054(A) 申请公布日期 1992.07.28
申请号 US19920476543 申请日期 1992.02.07
申请人 KANSAI PAINT CO., LTD. 发明人 IWASAWA, NAOZUMI;HIGASHI, JUNICHI
分类号 C09D5/44;C09D133/04;C09D175/04;G03F7/023;G03F7/16;H05K3/06 主分类号 C09D5/44
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