发明名称 Semiconductor device having a buffer structure for eliminating defects from a semiconductor layer grown thereon
摘要 A semiconductor service having a group III-V compound semiconductor layer formed on a buffer structure for intercepting propagation of defects, in which the buffer structure comprises a first material layer of a group III-V compound semiconductor material, a second material layer of a group III-V compound semiconductor material provided on the first material layer, the second material layer containing a first group III element and a second group III element different from the first group III element with a graded compositional profile in which the content of the second group III element is decreased towards an upper boundary and a lower boundary of the second material layer.
申请公布号 US5134446(A) 申请公布日期 1992.07.28
申请号 US19910725889 申请日期 1991.07.01
申请人 FUJITSU LIMITED 发明人 INOUE, TOSHIKAZU
分类号 H01L29/201;H01L21/20;H01L21/205;H01L29/205;H01L29/80;H01S5/00 主分类号 H01L29/201
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