发明名称 THICK FILM RESISTOR COMPOSITION AND MANUFACTURE THEREOF
摘要 <p>PURPOSE:To enhance ESD characteristics and to obtain a resistance value having excellent reproducibility by a method wherein glass powder, obtained by firing borosilicate glass containing metal oxide Ta2O5 and silicon in a nonoxidizing atmosphere, is used. CONSTITUTION:The title composition is composed of metal boride-containing borosilicate glass obtained by calcinating borosilicate, glass containing metal oxide Ta2O5, and silicon in a nonoxidizing atmosphere, metallic conductive substance selected from the group consisting of metal, a metal boride, a metal silicide, and a metal nitride, an organic bonding agent and an organic solvent. Also, silicon powder of 3 to 20wt.% in total is added to borosilicate glass powder containing the metal oxide Ta2O5 of 1 to 10mol% which is subjected to reduction by silicon in a nonoxidizing atmosphere at the temperature of 1000 deg.C or higher, they are mixed, the metal oxide Ta2O5 is reduced by silicon while a pretreatment firing operation is conducted in a nonoxidizing atmosphere at 1000 deg.C or higher, and metal boride-containing borosilicate glass power which uniformly contains fine metal boride TaB2 can be obtained.</p>
申请公布号 JPH04206501(A) 申请公布日期 1992.07.28
申请号 JP19900329723 申请日期 1990.11.30
申请人 SUMITOMO METAL MINING CO LTD 发明人 MORI KEISUKE
分类号 H01C17/06;H01C7/00 主分类号 H01C17/06
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