发明名称 ELECTROSTATIC CHUCK
摘要 <p>PURPOSE:To enhance an attraction and easily realize removal after turning OFF the power supply by forming an electrostatic chuck providing buried electrodes within a ferromagnetic ceramic which is mainly formed by calcium titanate or barium titanate and has a specific dielectric constant higher than the particular value. CONSTITUTION:An electrostatic chuck C is mainly formed by BaTiO3, CaTiO3, wherein an internal electrode 2 consisting of Ag, Pt, Pd is buried within a ferrodielectric ceramics 1 having a permitting of 50 or higher and a lead terminal 3 is also provided thereto in order to apply a voltage. A silicon wafer C is placed on the surface insulating layer 1a of this electrostatic chuck C and a voltage is applied across the internal electrode 2 and the silicon wafer. Thereby, polarization is generated across them and the silicon wafer is attracted by this electrostatic force. In this case, since the surface insulating layer 1a is formed by the ceramics, the surface having extremely excellent flatness. Moreover, due to excellent hardness and rigidity, it can be used for semiconductor manufacturing apparatus. In addition, since electrodes are buried in the side, it can be used even under to high temperature and corrosive ambient condition.</p>
申请公布号 JPH04206948(A) 申请公布日期 1992.07.28
申请号 JP19900339325 申请日期 1990.11.30
申请人 KYOCERA CORP 发明人 NAGASAKI KOICHI;USHIO MASAKI;ATARI HITOSHI
分类号 H01L21/683;H01L21/68 主分类号 H01L21/683
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