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发明名称
PROCEDIMENTO PER FORMARE UNA REGIONE DI ISOLAMENTO DI ELEMENTI IN UN DISPOSITIVO A SEMICONDUTTORE
摘要
申请公布号
ITMI912383(A1)
申请公布日期
1992.07.23
申请号
IT1991MI02383
申请日期
1991.09.09
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
JIN TAE-JE;LEE YOUNG-TAEK
分类号
H01L21/76;H01L;H01L21/316;H01L21/32;H01L21/762
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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