发明名称 Semiconductor device manufacturing apparatus and method of controlling the heat processing of wafers.
摘要 <p>A semiconductor device manufacturing apparatus has a heat retaining tube (8) which can be freely placed in and pulled out of a processing chamber (1) of the apparatus. When located within the processing chamber, the heat retaining tube (8) surrounds the periphery of a boat (5) with the semiconductor wafers (3) mounted thereon. After the heating process of the semiconductor wafers has been completed, the heat retaining tube (8) and the semiconductor wafers (3) are pulled out of the processing chamber (1). In this way, a difference in the temperature between the center and periphery of the semiconductor wafer can be decreased, and semiconductor devices, which has an excellent performance and which are free from crystal defects or dislocation, can thus be manufactured. &lt;IMAGE&gt;</p>
申请公布号 EP0495294(A1) 申请公布日期 1992.07.22
申请号 EP19910310019 申请日期 1991.10.30
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HASHIZUME, YASUSHI;TOMIKAWA, MITSUHIRO
分类号 H01L21/22;H01L21/00 主分类号 H01L21/22
代理机构 代理人
主权项
地址