| 摘要 |
PURPOSE:To improve sensitivity to radiation having short wavelength and dry etching resistance and to enable development with an aq. alkali soln. by adding a specified compd. to a compsn. CONSTITUTION:This photosensitive compsn. contains an alkali-soluble polymer and a compd. having a group which generates an acid under ionized radiation and one or more substituents which are decomposed by the acid. The compd. is represented by formula I (where one or more among R1-R4 are the above- mentioned substituents, when R1-R4 are not the substituents, R1 is optionally substd. aliphatic or arom. hydrocarbon, etc., each of R2 and R3 is H, optionally substd. aliphatic hydrocarbon, etc., and R4 is optionally substd. aliphatic or arom. hydrocarbon, etc.). A concrete example of the compd. represented by the formula I is a compd. represented by formula II. |
